Physical Review Letters Volume 116, Issue 19 features research by Professor Evgeny Tsymbal, J. D. Burton, and Xiaohui Liu. Their article is titled "Enhanced Tunneling Electroresistance in Ferroelectric Tunnel Junctions due to the Reversible Metallization of the Barrier."
This research is funded by the National Science Foundation, and is a partnership of the Materials Research Science and Engineering Center (MRSEC) program and the Center for Nanoferroic Devices (CNFD).
Image used with permission from the American Physical Society
