Nanofabrication:

Focus Ion Beam Milling
• A FEI focused ion beam workstation (StrtaTM FIB201xp) has a 5 nm beam size with gas injection system with platinum deposition, autoFIB software and optical microscope.
Optical Lithography
• Spin Coater, Laurell Model WS-400 and Bake ovens.
• Aligner, Karl Suss Model MJB3.
• Zeiss polarizing microscope with CCD camera. The resolution of this system is 0.5 ?m.
• Ion beam etcher, Torr International RIE300.
Thin film deposition
• One sputter system for the deposition of oxide films
• One multiple-gun sputter system for the deposition of multi-layers films
• Four atmosphere-controlled furnaces for sample-anneals and target- preparation.

Characterizations:

Magnetic Measurement
• Quantum Design SQUID magnetometer. Temperatures 1.4 K to 400 K and Fields up to 7 T.
• Ultramicro balance, Sartorius Supermicro S4. Resolution 0.1µgram.
Magnetic Domain Image and Metrology
• Two scanning probe microscopes (Nanoscope IIIa, Dimension 3000 and 3100 with frequency detection module for magnetic force microscopy and a UV laser for near field scanning optical microscopy).
• Permanent magnet with transverse magnetic field from –4 kOe to 4 kOe for domain images
• Permanent magnet with longitudinal magnetic field from –1.5 kOe to 1.5 kOe for domain images
Transport Measurement
• Wire Bonder, West Bond Model 7400IW
• DC and AC 4-probes measurement. Samples can be studied at temperatures from 1.4 K to 400 K in fields up to 5.5 T.
• Lake ShoreFC-EM4 electromagnet system with CCS-950T cryostat system, for AC and DC 4-probes measurement. Samples can be studied at temperatures from 10 K to 600 K in fields up to 1 T.

CMRA Central Service Facilities:

• X-Ray Materials Characterization Facility
• Electron Microscopy Facility; a EOL2010 TEM, a JEOL JSM840A SEM.

Shop Service Facilities:
The Department of Physics and Chemistry maintains a well-staffed machine shop, electronic shop and a glass blower to which we have access.